极品玩弄白浆喷水在线看_欧美又硬又长又黄又爽视频_二拍一视觉摄影怎么样_国内精品2020情侣视频_亚洲精品久久无码产区

3
HiPIMS principle

Xinbo Technology (Dongguan) CO., LTD

The principle of HiPIMS technology

In 1999, Kouznetsov et al. of Sweden successfully developed the High Power Impulse Magnetron Sputtering (HiPIMS) technology. It is characterized by using high-power pulses as the power supply mode of magnetron sputtering. On the premise of maintaining the same average power, by shortening the pulse time of the pulse power supply (30-300 us) and adjusting the pulse frequency (100-1000 Hz), the instantaneous peak power increases by three orders of magnitude (as shown in the figure below). As a result, ultra-high plasma density (1018~1019 m-3) is obtained, which is 3 to 4 orders of magnitude higher than that of traditional DCMS and MFMS techniques.

The principle of HiPIMS technology

Leave a message online